- All sections
- C - Chemistry; metallurgy
- C23C - Coating metallic material; coating material with metallic material; surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general
- C23C 16/455 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the method of coating characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber
Patent holdings for IPC class C23C 16/455
Total number of patents in this class: 9665
10-year publication summary
763
|
799
|
838
|
920
|
935
|
1003
|
998
|
1116
|
1084
|
301
|
2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
Applied Materials, Inc. | 16587 |
1396 |
Tokyo Electron Limited | 11599 |
924 |
Lam Research Corporation | 4775 |
737 |
ASM IP Holding B.V. | 1715 |
699 |
Kokusai Electric Corporation | 1791 |
610 |
Taiwan Semiconductor Manufacturing Company, Ltd. | 36809 |
168 |
Samsung Electronics Co., Ltd. | 131630 |
163 |
Versum Materials US, LLC | 591 |
140 |
Beneq Oy | 205 |
121 |
Entegris, Inc. | 1736 |
110 |
L'Air Liquide, Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude | 3515 |
104 |
Picosun Oy | 130 |
103 |
Aixtron SE | 288 |
89 |
Jusung Engineering Co., Ltd. | 359 |
70 |
Eastman Kodak Company | 3444 |
58 |
Samsung Display Co., Ltd. | 30585 |
55 |
Novellus Systems, Inc. | 559 |
55 |
UChicago Argonne, LLC | 866 |
53 |
Adeka Corporation | 1333 |
52 |
BASF SE | 19740 |
50 |
Other owners | 3908 |